Hafnia (HfO2) is a widely used material in various applications, including electronics, optics, and ceramics. However, its performance can be compromised by the presence of cracks, which can lead to mechanical failure and degradation. Doping is a common technique used to modify the properties of materials, and it has been explored as a means to mitigate crack formation in hafnia. This review aims to provide a comprehensive overview of the current state of research on doping hafnia to prevent or reduce crack formation.